ТЕХНОЛОГИЯ
| 期 | 标题 | 文件 | |
| 卷 52, 编号 2 (2023) | Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture |
 (Rus) |
|
| Efremov A., Betelin V., Kwon K. | |||
| 卷 52, 编号 2 (2023) | Investigation of the Optical Properties of Ultrathin Films Based on Metal Silicide |
(Rus) |
|
| Kerimov E. | |||
| 卷 52, 编号 1 (2023) | Параметры газовой фазы и кинетика реактивно-ионного травления SiO2 в плазме CF4/C4F8/Ar/He |
(Rus) |
|
| Ефремов А., Kwon K. | |||
| 1 - 3 的 3 信息 | |||